Photolithography magic

Photolithography machine is the core equipment of semiconductor manufacturing, which uses specific wavelengths of light (ultraviolet/deep ultraviolet/extreme ultraviolet) to project the chip design pattern on the mask onto the silicon wafer coated with photoresist in a reduced size; Subsequently, pattern carving and transfer are completed through processes such as development and etching, forming a nanoscale chip structure. The development of lithography machines covers many fields and cutting-edge technologies such as optics, precision instruments, polymer physics and chemistry, mechanics, automation, software, high-precision control, and fluid mechanics. As one of the three major components of semiconductor equipment, it is the crystallization of human civilization wisdom and the pinnacle of human technological manufacturing.

The unit is designed for unsupervised public use: controls are recessed or shielded, moving parts are enclosed, and the interface is operable by a child of about six with no instruction. Where a screen is used, the language can be switched without changing the hardware, and the content can be replaced on site.

Photolithography machine is a commonly used equipment in the semiconductor industry, used to transfer chip circuit diagrams from mask templates to silicon wafers. It is the core process of IC manufacturing, and the basic working principle of lithography machine is to use optical principles to project patterns onto silicon wafers. The core components of a lithography machine include a light source system, a projection optical system, a precision control system for the mask stage/wafer stage, and an environmental control system. The optical system is the "heart" of the lithography machine: DUV lithography machines use refractive lens groups, while EUV lithography machines use reflective mirror groups (because extreme ultraviolet light cannot penetrate ordinary glass). The working principle of lithography machine is based on optical projection technology. It uses an optical system to project the circuit design pattern onto a silicon wafer, and then uses photosensitive materials to create the circuit pattern. The lens is the most essential part of the lithography machine, and it is not an ordinary lens. It can reach a height of 2 meters and a diameter of 1 meter, or even larger. The entire exposure optical system of a lithography machine consists of several components.