High end chip production line coating machine

Magnetron sputtering coating machine is mainly used for preparing thin film materials. In the field of quantum technology, sputtering coating machines can be used for the growth of quantum materials and the coating of quantum chips to support basic scientific research and the development of quantum devices, sensors, and high-end chips. Sputtering coating technology is a technique that uses charged particles to bombard the surface of a target material in a vacuum environment, causing the released particles to deposit onto a substrate and form various thin films. To improve the deposition rate, high molecular weight inert gases (such as argon or xenon) are usually selected as sputtering gases to increase the high-energy collision frequency and accelerate the deposition process.

The unit is designed for unsupervised public use: controls are recessed or shielded, moving parts are enclosed, and the interface is operable by a child of about six with no instruction. Where a screen is used, the language can be switched without changing the hardware, and the content can be replaced on site.

The magnetron sputtering coating machine is used for growing quantum materials and structures, and together with the quantum device and chip processing center of the Quantum Institute, prepares quantum materials, structures, and devices for basic scientific research and the development of quantum devices, sensors, and high-end chips. Sputtering coating is a technique that uses charged particles to bombard the surface of a target in vacuum, causing the ejected particles to deposit on a substrate. In fact, it is the use of sputtering phenomenon to achieve the purpose of producing various thin films. In order to promote as many high-energy collisions as possible - thereby increasing the deposition rate - sputtering gases with high molecular weight, such as argon or xenon, are usually chosen.